Wet-Chemical Treatment of Si3N4 Surfaces Studied Using Infrared Attenuated Total Reflection Spectroscopy
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چکیده
Same as Report (SAR) 18. NUMBER
منابع مشابه
Surface etching, chemical modification and characterization of silicon nitride and silicon oxide--selective functionalization of Si3N4 and SiO2.
The ability to selectively chemically functionalize silicon nitride (Si3N4) or silicon dioxide (SiO2) surfaces after cleaning would open interesting technological applications. In order to achieve this goal, the chemical composition of surfaces needs to be carefully characterized so that target chemical reactions can proceed on only one surface at a time. While wet-chemically cleaned silicon di...
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In situ chemical methods for preparing atomically-clean surfaces of Si3N4 thin films in ultra-high vacuum (UHV) have been studied using X-ray and ultraviolet photoemission, electron energy loss and Auger electron spectroscopies. Prior to the UHV studies, the films (grown ex situ on Si(1 0 0) wafers by low-pressure chemical vapor deposition) were characterized using primarily infrared reflection...
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تاریخ انتشار 2011